Mechanical Properties and Diffusion Barrier Performance of CrWN Coatings Fabricated through Hybrid HiPIMS/RFMS

被引:7
作者
Chang, Li-Chun [1 ,2 ]
Wu, Cheng-En [1 ]
Ou, Tzu-Yu [1 ]
机构
[1] Ming Chi Univ Technol, Dept Mat Engn, New Taipei 24301, Taiwan
[2] Ming Chi Univ Technol, Ctr Plasma & Thin Film Technol, New Taipei 24301, Taiwan
关键词
diffusion barrier; HiPIMS; mechanical properties; RFMS; NITRIDE THIN-FILMS; CHROMIUM NITRIDE; TRIBOLOGICAL PROPERTIES; OXIDATION RESISTANCE; HIGH-TEMPERATURE; N FILMS; TUNGSTEN; MICROSTRUCTURE; DEPOSITION; BEHAVIOR;
D O I
10.3390/coatings11060690
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
CrWN coatings were fabricated through a hybrid high-power impulse magnetron sputtering/radio-frequency magnetron sputtering technique. The phase structures, mechanical properties, and tribological characteristics of CrWN coatings prepared with various nitrogen flow ratios (f(N2)s) were investigated. The results indicated that the CrWN coatings prepared at f(N2) levels of 0.1 and 0.2 exhibited a Cr2N phase, whereas the coatings prepared at f(N2) levels of 0.3 and 0.4 exhibited a CrN phase. These CrWN coatings exhibited hardness values of 16.7-20.2 GPa and Young's modulus levels of 268-296 GPa, which indicated higher mechanical properties than those of coatings with similar residual stresses prepared through conventional direct current magnetron sputtering. Face-centered cubic (fcc) Cr51W2N47 coatings with a residual stress of -0.53 GPa exhibited the highest wear and scratch resistance. Furthermore, the diffusion barrier performance of fcc CrWN films on Cu metallization was explored, and they exhibited excellent barrier characteristics up to 650 degrees C.
引用
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页数:14
相关论文
共 62 条
[1]   Characterization of tantalum zirconium nitride sputter-deposited nanocrystalline coatings [J].
Aouadi, SM ;
Filip, P ;
Debessai, M .
SURFACE & COATINGS TECHNOLOGY, 2004, 187 (2-3) :177-184
[2]  
Barin I., 1995, THERMOCHEMICAL DATA, V1, DOI DOI 10.1002/9783527619825
[3]   Residual stress control in TiN/Si coatings deposited by unbalanced magnetron sputtering [J].
Bielawski, M .
SURFACE & COATINGS TECHNOLOGY, 2006, 200 (12-13) :3987-3995
[4]   Mechanical Properties of Zr-Si-N Films Fabricated through HiPIMS/RFMS Co-Sputtering [J].
Chang, Li-Chun ;
Zheng, Yu-Zhe ;
Chen, Yung-I .
COATINGS, 2018, 8 (08)
[5]   Ta-Zr-N Thin Films Fabricated through HIPIMS/RFMS Co-Sputtering [J].
Chang, Li-Chun ;
Chang, Ching-Yen ;
You, Ya-Wen .
COATINGS, 2017, 7 (11)
[6]   Mechanical properties and oxidation resistance of sputtered Cr-W-N coatings [J].
Chang, Li-Chun ;
Zheng, Yu-Zhe ;
Gao, Yu-Xiang ;
Chen, Yung-I .
SURFACE & COATINGS TECHNOLOGY, 2017, 320 :196-200
[7]   Mechanical properties and oxidation resistance of reactively sputtered Ta1 - xZrxNy thin films [J].
Chang, Li-Chun ;
Chang, Ching-Yen ;
Chen, Yung-I .
SURFACE & COATINGS TECHNOLOGY, 2015, 280 :27-36
[8]   Effect of nitrogen flow rate on TaN diffusion barrier layer deposited between a Cu layer and a Si-based substrate [J].
Chen, Shih-Fan ;
Wang, Shea-Jue ;
Yang, Tzu-Hsien ;
Yang, Zheng-Da ;
Bor, Hui-Yun ;
Wei, Chao-Nan .
CERAMICS INTERNATIONAL, 2017, 43 (15) :12505-12510
[9]   Commentary on using H/E and H3/E2 as proxies for fracture toughness of hard coatings [J].
Chen, Xinjie ;
Du, Yao ;
Chung, Yip-Wah .
THIN SOLID FILMS, 2019, 688
[10]   Chemical inertness of Cr-W-N coatings in glass molding [J].
Chen, Yung-I ;
Cheng, Yu-Ru ;
Chang, Li-Chun ;
Lee, Jyh-Wei .
THIN SOLID FILMS, 2015, 593 :102-109