Reactive sputter deposition of CoCrCuFeNi in oxygen/argon mixtures

被引：7

作者：

Dedoncker, R. ^{[1
]}

Radnoczi, G. ^{[2
]}

Abadias, G. ^{[3
]}

Depla, D. ^{[1
]}

机构：

[1] Univ Ghent, Dept Solid State Sci, Krijgslaan 281 S1, B-9000 Ghent, Belgium

[2] Hungarian Acad Sci, Ctr Energy Res, Konkoly Thege M U 29-33, H-1121 Budapest, Hungary

[3] Univ Poitiers, Inst Pprime, Dept Phys & Mecan Mat, UPR CNRS 3346, F-86962 Futuroscope, France

来源：

SURFACE & COATINGS TECHNOLOGY | 2019年 / 378卷

关键词：

Sputter deposition; Multi-principal element alloys; Oxides; ENTROPY; MICROSTRUCTURE; FILM;

D O I：

10.1016/j.surfcoat.2019.02.045

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Thin films of (CoCrCuFeNi)O-x were deposited by direct current magnetron sputtering in a mixed O-2/Ar atmosphere. Stoichiometric films with a rock-salt (B1) crystal structure and a zone T microstructure were obtained at high oxygen pressures. HR-TEM and STEM studies demonstrated a homogeneous elemental distribution, the constituting metals are in a solid solution on the cation sites. This material system shows several similarities with sputtering the same alloy in a mixed N-2/Ar atmosphere: a textural change from a < 111 > to a < 100 > out-of-plane alignment occurs with the introduction of the reactive gas species and at high reactive gas flows, both systems achieve a B1 structure. The most profound difference is the higher incorporation rate of oxygen compared to nitrogen, which can be attributed to a larger electronegativity of the former element.

引用

页数：6

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