Temperature-dependent heterojunction device characteristics of n-ZnO nanorods/p-Si substrate assembly

Heterojunction diode based on n-ZnO nanorods/p-Silicon (Si) assembly was fabricated, examined and reported here. Horizontal quartz tube thermal evaporation technique was used for the growth of ZnO nanorods on Si substrate. The nanorods were characterized by several techniques to examine the structural, morphological, scattering and electrical properties. Wurtzite hexagonal phase of the grown aligned nanorods was observed using X-ray diffraction (XRD) and scanning electron microscopy (SEM). The appearance of a sharp Raman peak at 438 cm(-1) was observed and it is related to the E-2(high) mode of the wurtzite hexagonal phase of ZnO. The electrical properties of the fabricated heterojunction assembly were examined at different temperatures (298 similar to 398 K) in both reverse and forward biased conditions, and a good stability was observed over the entire temperature range. A reduction in the turn-on and breakdown voltage was observed with increasing temperature. By increasing the temperature, the effective potential barrier height was increased, while quality factor was decreased. The observed activation energy was found to be similar to 93.4 meV, higher than the exciton binding energy of ZnO.