A highly selective laser ion source for bunched, low emittance beam release

被引:16
|
作者
Wendt, K [1 ]
Blaum, K
Brück, K
Geppert, C
Kluge, HJ
Mukherjee, M
Passler, G
Schwarz, S
Sirotzki, S
Wies, K
机构
[1] Univ Mainz, Inst Phys, D-55099 Mainz, Germany
[2] GSI Darmstadt, D-64291 Darmstadt, Germany
[3] Michigan State Univ, NSCL, E Lansing, MI 48824 USA
关键词
D O I
10.1016/j.nuclphysa.2004.09.067
中图分类号
O57 [原子核物理学、高能物理学];
学科分类号
070202 ;
摘要
A novel type of resonance ionization laser ion source (RILIS) is under development, which combines the advantages of laser ionization with those of a source-implemented ion trap. This laser ion source trap (LIST) system, based on a gas-filled linear radio-frequency quadrupole ion trap, decouples the evaporation and ionization process by introduction of a primary surface ion repeller. Apart from significantly enhancing the selectivity in radioactive ion beam production, optimum control on the temporal pulse structure and the emittance of the generated laser ion bunch is obtained. A variety of operational modes from quasi-dc to microseconds-bunched ion beams with variable repetition rate can be set. Principles and layout of individual components of the LIST are presented on the basis of atom and ion trajectory simulations and resulting performance parameters are discussed.
引用
收藏
页码:47C / 53C
页数:7
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