Ab initio study of reflectance anisotropy spectra of a submonolayer oxidized Si(100) surface -: art. no. 035350

被引:31
作者
Incze, A
Del Sole, R
Onida, G
机构
[1] Univ Milan, Ist Nazl Fis Mat, I-20133 Milan, Italy
[2] Univ Milan, Dipartimento Fis, I-20133 Milan, Italy
[3] Univ Roma Tor Vergata, Ist Nazl Fis Mat, I-00133 Rome, Italy
[4] Univ Roma Tor Vergata, Dipartimento Fis, I-00133 Rome, Italy
来源
PHYSICAL REVIEW B | 2005年 / 71卷 / 03期
关键词
D O I
10.1103/PhysRevB.71.035350
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The effects of oxygen adsorption on the reflectance anisotropy spectrum (RAS) of reconstructed Si(100):O surfaces at submonolayer coverage (first stages of oxidation) have been studied by an ab initio density-functional theory local-density approximation scheme within a plane-wave, norm-conserving pseudopotential approach. Dangling bonds and the main features of the characteristic RAS of the clean Si(100) surface are mostly preserved after oxidation of 50% of the surface dimers, with some visible changes: a small redshift of the first peak, and the appearance of a distinct spectral structure at about 1.5 eV. The electronic transitions involved in the latter have been analyzed through state-by-state and layer-by-layer decompositions of the RAS. We suggest that the interplay between present theoretical results and reflectance anisotropy spectroscopy experiments could lead to further clarification of structural and kinetic details of the Si(100) oxidation process in the submonolayer range.
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页数:7
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