Operando hard X-ray photoelectron spectroscopy study of the Pt/Ru/PbZr0.52Ti0.48O3 interface

被引:12
作者
Gueye, Ibrahima [1 ,2 ]
Le Rhun, Gwenael [1 ,2 ]
Renault, Olivier [1 ,2 ]
Cooper, David [1 ,2 ]
Ceolin, Denis [3 ]
Rueff, Jean-Pascal [3 ]
Barrett, Nicholas [4 ]
机构
[1] Univ Grenoble Alpes, F-38000 Grenoble, France
[2] CEA, LETI, MINATEC Campus, F-38054 Grenoble, France
[3] Synchrotron SOLEIL, BP 48, F-91192 Gif Sur Yvette, France
[4] Univ Paris Saclay, CNRS, CEA, SPEC, F-91191 Gif Sur Yvette, France
关键词
THIN-FILMS; PHOTOEMISSION; SOL;
D O I
10.1063/1.4993909
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have used hard X-ray photoelectron spectroscopy to probe the Pt/Ru/PbZr0.52Ti0.48O3 (PZT) interface in a Pt/Ru/PZT (220 nm)/Pt/TiO2/SiO2/Si stack. A customized sample-holder allows in-situ photoemission analysis while applying bias to the capacitor. Hard X-rays probe the buried interface between the top electrode and the ferroelectric PZT. The use of operando conditions reveals a polarization-dependent electronic response, most probably due to imperfect screening of the depolarizing field. There is evidence for an additional core level component related to the electrode-PZT interface. Zr oxide nanostructures at the surface of the sol-gel layer may form a ferroelectric dead layer at the interface, affecting device performance. Published by AIP Publishing.
引用
收藏
页数:4
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