Dislocation scattering in a two-dimensional electron gas of an AlxGa1-xN/GaN heterostructure

被引:4
|
作者
Han, XX [1 ]
Li, DB [1 ]
Yuan, HR [1 ]
Sun, XH [1 ]
Liu, XL [1 ]
Wang, XH [1 ]
Zhu, QS [1 ]
Wang, ZG [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
来源
PHYSICA STATUS SOLIDI B-BASIC RESEARCH | 2004年 / 241卷 / 13期
关键词
D O I
10.1002/pssb.200402080
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The theoretical electron mobility limited by dislocation scattering of a two-dimensional electron gas confined near the interface of an AlxGa1-xN/GaN heterostructure is calculated. The accurate wave functions and electron distributions of the three lowest subbands for a typical structure are obtained by solving the Schrodinger and Poisson equations self-consistently. Based on the model of treating dislocation as a charged line, a simple scattering potential, a square-well potential, is utilized. The estimated mobility suggests that such a choice can simplify the calculation without introducing significant deviation from experimental data. It is also found that the dislocation scattering dominates both the low- and moderate-temperature mobilities and accounts for the nearly flattening-out behavior with increasing temperature. To clarify the role of dislocation scattering all standard scattering mechanisms are included in the calculation.
引用
收藏
页码:3000 / 3008
页数:9
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