A Novel Parameter Extraction Technique of Microwave Small-Signal Model for Nanometer MOSFETS
被引:2
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作者:
Cao, Yang
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机构:
Tianjin Univ, Sch Microelect, Tianjin 300072, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Cao, Yang
[1
]
Zhang, Wei
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机构:
Tianjin Univ, Sch Microelect, Tianjin 300072, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Zhang, Wei
[1
]
Fu, Jun
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机构:
Tsinghua Univ, Inst Microelect, Beijing Natl Res Ctr Informat Sci & Technol BNRis, Beijing 100084, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Fu, Jun
[2
]
Wang, Quan
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机构:
Shanghai Integrated Circuit Res & Dev Ctr, Applicat Dev Dept, Shanghai 201210, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Wang, Quan
[3
]
Liu, Linlin
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机构:
Shanghai Integrated Circuit Res & Dev Ctr, Applicat Dev Dept, Shanghai 201210, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Liu, Linlin
[3
]
Guo, Ao
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Shanghai Integrated Circuit Res & Dev Ctr, Applicat Dev Dept, Shanghai 201210, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Guo, Ao
[3
]
机构:
[1] Tianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
[2] Tsinghua Univ, Inst Microelect, Beijing Natl Res Ctr Informat Sci & Technol BNRis, Beijing 100084, Peoples R China
[3] Shanghai Integrated Circuit Res & Dev Ctr, Applicat Dev Dept, Shanghai 201210, Peoples R China
In this letter, the MOSFET small-signal equivalent circuit models under different bias conditions are analyzed for microwave applications. A novel parameter extraction technique named multi-parameter scanning (MPS) method is proposed. Under zero-bias, the MPS technique is used to extract the extrinsic parasitics and internal capacitances without using any high-frequency or low-frequency approximations. Extrinsic series resistances and substrate network are assumed to be bias-independent or at least have weak bias dependence. Therefore, after removing the extrinsic parasitics, the intrinsic elements in the saturation region can be formulated and directly extracted through linear-fitting to the measurement data. A set of nMOS test structures fabricated on the Shanghai Huali Microelectronics Corporation (HLMC) RF CMOS process are used for the investigation and validation of the proposed technique.
机构:
Hankuk Univ Foreign Studies, Dept Elect Engn, Kyungki Do 449791, South KoreaHankuk Univ Foreign Studies, Dept Elect Engn, Kyungki Do 449791, South Korea
Lee, S
Kim, CS
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机构:Hankuk Univ Foreign Studies, Dept Elect Engn, Kyungki Do 449791, South Korea
Kim, CS
Yu, HK
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机构:Hankuk Univ Foreign Studies, Dept Elect Engn, Kyungki Do 449791, South Korea
机构:
Tianjin Univ, Sch Microelect, Tianjin 300072, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Cao, Yang
Zhang, Wei
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h-index: 0
机构:
Tianjin Univ, Sch Microelect, Tianjin 300072, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Zhang, Wei
Fu, Jun
论文数: 0引用数: 0
h-index: 0
机构:
Tsinghua Univ, Inst Microelect, Tsinghua Natl Lab Informat Sci & Technol, Beijing 100084, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Fu, Jun
Wang, Quan
论文数: 0引用数: 0
h-index: 0
机构:
Shanghai Integrated Circuit Res & Dev Ctr, Applicat Dev Dept, Shanghai 201210, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Wang, Quan
Liu, Linlin
论文数: 0引用数: 0
h-index: 0
机构:
Shanghai Integrated Circuit Res & Dev Ctr, Applicat Dev Dept, Shanghai 201210, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
Liu, Linlin
Guo, Ao
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h-index: 0
机构:
Shanghai Integrated Circuit Res & Dev Ctr, Applicat Dev Dept, Shanghai 201210, Peoples R ChinaTianjin Univ, Sch Microelect, Tianjin 300072, Peoples R China
机构:
Institute of Microelectronics, Chinese Academy of SciencesKey Laboratory of Wide Band-Gap Semiconductor Materials and Devices, School of Advanced Materials and Nanotechnology,Xidian University
魏珂
马晓华
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机构:
Key Laboratory of Wide Band-Gap Semiconductor Materials and Devices, School of Advanced Materials and Nanotechnology,Xidian UniversityKey Laboratory of Wide Band-Gap Semiconductor Materials and Devices, School of Advanced Materials and Nanotechnology,Xidian University
机构:
Xidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaXidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
Yu Le
Zheng Yingkui
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机构:
Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaXidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
Zheng Yingkui
Zhang Sheng
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机构:
Xidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaXidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
Zhang Sheng
Pang Lei
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机构:
Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaXidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
Pang Lei
Wei Ke
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机构:
Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R ChinaXidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China
Wei Ke
Ma Xiaohua
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机构:
Xidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R ChinaXidian Univ, Sch Adv Mat & Nanotechnol, Key Lab Wide Band Gap Semicond Mat & Devices, Xian 710071, Peoples R China