SELECTIVE ELECTROLESS NICKEL PLATING ON OXYGEN-PLASMA-ACTIVATED GOLD SEED-LAYERS FOR THE FABRICATION OF LOW CONTACT RESISTANCE VIAS AND MICROSTRUCTURES

被引:5
作者
Fischer, A. C. [1 ]
Lapisa, M. [1 ]
Roxhed, N. [1 ]
Stemme, G. [1 ]
Niklaus, F. [1 ]
机构
[1] KTH Royal Inst Technol, Stockholm, Sweden
来源
MEMS 2010: 23RD IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST | 2010年
关键词
SILICON;
D O I
10.1109/MEMSYS.2010.5442462
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a novel technique to selectively deposit nickel by electroless plating on gold seed layers using an oxygen-plasma-activation step. No prior wet surface pre- treatments or metal oxide etches are required. This enables the manufacturing of low-resistance vias for heterogeneous three-dimensional (3D) integration of MEMS but it is also a suitable technique for the fabrication of arbitrary shaped nickel-microstructures using chemically stable and cost-effective electroless nickel plating baths.
引用
收藏
页码:472 / 475
页数:4
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