Evaporation-controlled self-assembly of silica surfactant mesophases

被引:146
|
作者
Gibaud, A [1 ]
Grosso, D
Smarsly, B
Baptiste, A
Bardeau, JF
Babonneau, F
Doshi, DA
Chen, Z
Brinker, CJ
Sanchez, C
机构
[1] Univ Maine, CNRS, UMR, Lab Phys Etat Condense, F-72085 Le Mans 09, France
[2] Univ Paris 06, Lab Chem Matiere Condensee, F-75252 Paris 05, France
[3] Univ New Mexico, Ctr Micro Engineered Mat, Adv Mat Lab, Albuquerque, NM 87106 USA
[4] Univ New Mexico, Adv Mat Lab, Dept Chem & Nucl Engn, Albuquerque, NM 87106 USA
[5] Sandia Natl Labs, Albuquerque, NM 87185 USA
来源
JOURNAL OF PHYSICAL CHEMISTRY B | 2003年 / 107卷 / 25期
关键词
D O I
10.1021/jp027612l
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Surfactant templated silica mesophases belong to the class of self-assembled materials that exhibit long range ordered two-dimensional (2D) hexagonal, three-dimensional (3D) hexagonal, or 3D cubic mesostructures when the composition of the initial deposited solution and its aging time have been optimized. Thin films of such mesophases with a thickness typically less than 300 nm are now routinely obtained by dip coating. In this study a reference solution was used with a chemical composition leading to the formation of thin films with a 3D hexagonal (P6(3)/mmc) mesostructure by dip coating. Thick films (about 10 mum thick) were alternatively prepared by a evaporation-controlled self-assembly (ECSA) process and studied with grazing incidence small-angle X-ray scattering (GISAXS). In the ECSA process, the mesostructure was developed under slower evaporation conditions than for dip-coated films by finely tuning the ethanol/H2O evaporation rate of the reference solution horizontally deposited on a silicon wafer. It is shown that the evaporation rate of the solvent is one of the key parameters that control the final mesostructure and can, under certain conditions, promote the formation of the cubic mesophase. The ability to precisely control such a structural arrangement on the mesoscale is of major interest for making sensor arrays, nanoreactors, photonic and fluidic devices, and low dielectric constant films.
引用
收藏
页码:6114 / 6118
页数:5
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