Turbostractic boron nitride produced by ion bombardment

Fine structures appearing in boron nitride(BN) sample bomparded by N-2(+) ion (60keV) were examined by JEM-200cx high-resolution transmission electron microscopy (HRTEM) at 200kV accelerating voltage. In the curved region of plate-like h-BN crystal sp(2) sheets (spacing 0.33nm), it was observed that the t-BN structure with an average inter-planer spacing of 0.35 nm was formed. Although the mechanism of formation of the t-BN structure is unclear, it appears that our discussion based on the viewpoint of beam-solid interaction may be critical in understanding the growth process of the t-BN structures.