Mechanism study on UV-induced photodegradation of nonylphenol ethoxylates by intermediate products analysis
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作者:
Chen, Ling
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机构:Sun Yat Sen Univ, Instrumental Anal & Res Ctr, Guangzhou 510275, Peoples R China
Chen, Ling
Zhou, Hai Yun
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Sun Yat Sen Univ, Instrumental Anal & Res Ctr, Guangzhou 510275, Peoples R ChinaSun Yat Sen Univ, Instrumental Anal & Res Ctr, Guangzhou 510275, Peoples R China
Zhou, Hai Yun
[1
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Liu, Lan
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机构:Sun Yat Sen Univ, Instrumental Anal & Res Ctr, Guangzhou 510275, Peoples R China
Liu, Lan
Deng, Qin Ying
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机构:Sun Yat Sen Univ, Instrumental Anal & Res Ctr, Guangzhou 510275, Peoples R China
Deng, Qin Ying
机构:
[1] Sun Yat Sen Univ, Instrumental Anal & Res Ctr, Guangzhou 510275, Peoples R China
[2] Sun Yat Sen Univ, Sch Chem & Chem Engn, Guangzhou 510275, Peoples R China
Photodegradation of nonylphenol ethoxylates (NP10EO) was investigated in laboratory scale under UV irradiation. The intermediate photodegradation products were analyzed by LC-ESI-MS. Three kinds of intermediate products including aldehydic compounds, carboxylic compounds and cyclohexanyl compounds were identified. Five main degradation routes involving the oxidation of the alkyl chain and ethoxylate unit, shortening of the alkyl chain and ethoxylate unit, hydrogenation of the benzene ring were proposed. (c) 2007 Hai Yon Zhou. Published by Elsevier B.V. on behalf of Chinese Chemical Society. All rights reserved.