Electron irradiation effect on the reverse phase transformation temperatures in TiNi shape memory alloy thin films

被引:8
作者
Wang, ZG
Zu, XT [1 ]
Fu, YQ
Zhu, S
Wang, LM
机构
[1] Univ Elect Sci & Technol China, Dept Appl Phys, Chengdu 610054, Peoples R China
[2] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England
[3] Univ Michigan, Dept Nucl Engn & Radiol Sci, Ann Arbor, MI 48109 USA
[4] Univ Elect Sci & Technol China, Natl Key Lab High Power Vacuum Elect, Chengdu 610054, Peoples R China
基金
中国国家自然科学基金;
关键词
TiNi thin films; electron irradiation; martensitic transformation; DSC;
D O I
10.1016/j.nimb.2004.09.001
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
In this work, Ti-Ni shape memory alloy thin films were irradiated by I.7MeV electron with three types of fluences: 4 x 10(20) 7x 10(20) and 1 X 10(21)/m(2). The influence of electron irradiation on the transformation behavior of the TiNi thin films were investigated by differential scanning calorimetry. The transformation temperatures A(s) and A(f) shifted to higher temperature after electron irradiation, the martensite was stabilized. The electron irradiation effect can be easily eliminated by one thermal cycle. The shifts of the transformation temperatures can be explained from the change of potential energy barrier and coherency energy between parent phase and martensite after irradiation. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:337 / 342
页数:6
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