Optical, electrical and mechanical properties of TiN thin film obtained from a TiO2 sol-gel coating and rapid thermal nitridation

被引：32

作者：

Valour, Arnaud ^{[1
]}

Higuita, Maria Alejandra Usuga ^{[1
]}

Guillonneau, Gaylord ^{[2
]}

Crespo-Monteiro, Nicolas ^{[1
]}

Jamon, Damien ^{[1
]}

Hochedel, Marion ^{[1
]}

Michalon, Jean-Yves ^{[1
]}

Reynaud, Stephanie ^{[1
]}

Vocanson, Francis ^{[1
]}

Jimenez, Carmen ^{[3
]}

Langlet, Michel ^{[3
]}

Donnet, Christophe ^{[1
]}

Jourlin, Yves ^{[1
]}

机构：

[1] Univ Lyon, Lab Hubert Curien, UMR CNRS 5516, F-42000 St Etienne, France

[2] Ecole Cent Lyon, Lab Tribol & Dynam Syst UMR 5516, F-69131 Ecully, France

[3] Univ Grenoble Alpes, Lab Mat & Genie Phys, UMR CNRS 5628, F-38000 Grenoble, France

来源：

SURFACE & COATINGS TECHNOLOGY | 2021年 / 413卷

关键词：

Titanium nitride; Sol-gel method; Rapid thermal nitridation; Mechanical; Electrical; Optical properties; CHEMICAL-VAPOR-DEPOSITION; TITANIUM NITRIDE; PLASMONIC MATERIAL; SUBSTRATE; HARDNESS; GROWTH;

D O I：

10.1016/j.surfcoat.2021.127089

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

This study reports the optical, electrical and mechanical properties of TiN films prepared by direct rapid thermal nitridation process from a photo-patternable TiO2 sol-gel layer. The sol-gel approach is compatible to non-planar and large substrates and allows the micro-nanotexturing of crystallized TiN surfaces in a significantly short time, large scale and at a lower cost compared to TiN layer deposition from existing and conventional processes (CVD, PVD, ALD...). In this paper, the optical measurements are carried out by optical spectroscopy in the UV, visible and near-IR region and by ellipsometry. The resistivity and the conductivity are estimated by four-point probe method, while hardness is characterized by nano-indentation experiments. The results indicate that the TiN thin film made by sol-gel method and rapid thermal nitridation are very promising for the manufacturing of optical metasurfaces devices or new plasmonic materials.

引用

页数：7

共 41 条

[1] Conductivity and the Hall coefficient of nanostructured titanium nitride films [J].