Templated Sub-100-nm-Thick Double-Gyroid Structure from Si-Containing Block Copolymer Thin Films

被引：16
作者：
Aissou, Karim [1 ]
Mumtaz, Muhammad [1 ]
Portale, Giuseppe [2 ]
Brochon, Cyril [1 ]
Cloutet, Eric [1 ]
Fleury, Guillaume [1 ]
Hadziioannou, Georges [1 ]
机构：
[1] Univ Bordeaux, Lab Chim Polymeres Organ, CNRS, ENSCPB, 16 Ave Pey Berland, F-33607 Pessac, France
[2] Univ Groningen, Zernike Inst Adv Mat, Macromol Chem & New Polymer Mat, Nijenborgh 4, NL-9747 AG Groningen, Netherlands
来源：
SMALL | 2017年 / 13卷 / 20期
关键词：
HIGH-SURFACE-AREA; ARCHIMEDEAN TILINGS; PHASE; MORPHOLOGY; TRANSFORMATIONS; TRANSITIONS; ARRAYS;
D O I：
10.1002/smll.201603777
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
The directed self-assembly of diblock copolymer chains (poly(1,1-dimethyl silacyclobutane)-block-polystyrene, PDMSB-b-PS) into a thin film double gyroid structure is described. A decrease of the kinetics of a typical double-wave pattern formation is reported within the 3D-nanostructure when the film thickness on mesas is lower than the gyroid unit cell. However, optimization of the solvent-vapor annealing process results in very large grains (over 10 mu m(2)) with specific orientation (i.e., parallel to the air substrate) and direction (i.e., along the groove direction) of the characteristic (211) plane, demonstrated by templating sub-100-nm-thick PDMSB-b-PS films.
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页数：6
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