Glow discharge mass spectrometry

被引：136

作者：

Hoffmann, V ^{[1
]}

Kasik, M

Robinson, PK

Venzago, C

机构：

[1] Leibniz Inst Solid State & Mat Res Dresden, D-01171 Dresden, Germany

[2] Shiva Technol Inc, Syracuse, NY 13211 USA

[3] Mass Spectrometry Int, Hanover Business Pk, Altrincham, Cheshire, England

[4] Degussa AG, D-63457 Hanau, Germany

来源：

ANALYTICAL AND BIOANALYTICAL CHEMISTRY | 2005年 / 381卷 / 01期

关键词：

glow discharge mass spectrometry; depth profile; temperature; fast flow; pulse;

D O I：

10.1007/s00216-004-2933-2

中图分类号：

Q5 [生物化学];

学科分类号：

071010 ; 081704 ;

摘要：

Over the past twenty years or so, glow discharge mass spectrometry (GDMS) has become the industry standard for the analysis of trace elements in metals and semiconductors. A review of its history is followed by a picture of the present situation and a look to where the future may lie. Applications are summarised, including the ability of GDMS to offer depth-resolved data and non-conductor analysis, and the well-documented quantitative nature of the results is reviewed. The effects resulting from the physical properties of the analyte material are discussed at length. Finally, recent work such as "fast flow" sources and pulsed glow discharges is reviewed.

引用

页码：173 / 188

页数：16

共 166 条

[1] Investigation of mechanisms of corrosion due to diffusion of impurities by direct current glow discharge mass spectrometry depth profiling [J].