Model for electron-beam-induced crystallization of amorphous Me-Si-C (Me = Nb or Zr) thin films

被引：9

作者：

Tengstrand, Olof ^{[1
]}

Nedfors, Nils ^{[2
]}

Andersson, Matilda ^{[2
]}

Lu, Jun ^{[1
]}

Jansson, Ulf ^{[2
]}

Flink, Axel ^{[1
,3
]}

Eklund, Per ^{[1
]}

Hultman, Lars ^{[1
]}

机构：

[1] Linkoping Univ, Dept Phys Chem & Biol IFM, Thin Film Phys Div, S-58183 Linkoping, Sweden

[2] Uppsala Univ, Angstrom Lab, Dept Chem, S-75121 Uppsala, Sweden

[3] Impact Coatings AB, S-58216 Linkoping, Sweden

来源：

JOURNAL OF MATERIALS RESEARCH | 2014年 / 29卷 / 23期

关键词：

MECHANICAL-PROPERTIES; TRIBOLOGICAL BEHAVIOR; METALLIC GLASSES; IRRADIATION; STABILITY; COATINGS; MICROSCOPY; ALLOYS; PHASE; TEM;

D O I：

10.1557/jmr.2014.345

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We use transmission electron microscopy (TEM) for in situ studies of electron-beam-induced crystallization behavior in thin films of amorphous transition metal silicon carbides based on Zr (group 4 element) and Nb (group 5). Higher silicon content stabilized the amorphous structure while no effects of carbon were detected. Films with Nb start to crystallize at lower electron doses than the Zr-containing ones. During the crystallization, equiaxed MeC grains are formed in all samples with larger grains for ZrC (similar to 5 nm) compared to NbC (similar to 2 nm). The phenomenon of self-terminating crystallization at a dimension of 2-5 nm is explained by segregation of Si that is expelled from growing metal carbide grains into the surrounding amorphous phase matrix, which limits diffusion of the metal and carbon.

引用

页码：2854 / 2862

页数：9

共 37 条

[21] Magnetron sputtered Ti-Si-C thin films prepared at low temperatures [J].

Lopes, C. ;

Parreira, N. M. G. ;

Carvalho, S. ;

Cavaleiro, A. ;

Riviere, J. R. ;

Le Bourhis, E. ;

Vaz, F. .

SURFACE & COATINGS TECHNOLOGY, 2007, 201 (16-17) :7180-7186

[22]

Mukherjee M., 2011, Silicon Carbide - Materials, Processing and Applications in Electronic Devices

[23] Influence of composition and structural properties in the tribological behaviour of magnetron sputtered Ti-Si-C nanostructured thin films, prepared at low temperature [J].

Munteanu, D. ;

Ionescu, C. ;

Olteanu, C. ;

Munteanu, A. ;

Davin, F. ;

Cunha, L. ;

Moura, C. ;

Vaz, F. .

WEAR, 2010, 268 (3-4) :552-557

[24] MeV electron irradiation induced crystallization in metallic glasses: Atomic structure, crystallization mechanism and stability of an amorphous phase under the irradiation [J].

Nagase, Takeshi ;

Sanda, Tomohiro ;

Nino, Akihiro ;

Qin, Wen ;

Yasuda, Hidehiro ;

Mori, Hirotaro ;

Umakoshi, Yukichi ;

Szpunar, Jerzy A. .

JOURNAL OF NON-CRYSTALLINE SOLIDS, 2012, 358 (03) :502-518

[25] Formation and thermal stability of amorphous Ti-Si-C alloys [J].

Naka, M ;

Sakai, H ;

Maeda, M ;

Mori, H .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 1997, 226 :774-778

[26]

Nakamori T., 1987, Transactions of the Institute of Electronics, Information and Communication Engineers E, VE70, P1133

[27] Characterization of amorphous and nanocomposite Nb-Si-C thin films deposited by DC magnetron sputtering [J].

Nedfors, Nils ;

Tengstrand, Olof ;

Flink, Axel ;

Eklund, Per ;

Hultman, Lars ;

Jansson, Ulf .

THIN SOLID FILMS, 2013, 545 :272-278

[28] C-Zr (carbon-zirconium) [J].

Okamoto, H .

JOURNAL OF PHASE EQUILIBRIA, 1996, 17 (02) :162-162

[29] Structural and mechanical properties of TiC and Ti-Si-C films deposited by pulsed laser deposition [J].

Phani, AR ;

Krzanowski, JE ;

Nainaparampil, JJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (05) :2252-2258

[30] Annealing studies of nanocomposite Ti-Si-C thin films with respect to phase stability and tribological performance [J].

Rester, M. ;

Neidhardt, J. ;

Eklund, P. ;

Emmerlich, J. ;

Ljungcrantz, H. ;

Hultman, L. ;

Mitterer, C. .

MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2006, 429 (1-2) :90-95

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