Dependence of multifractal analysis parameters on the darkness of a processed image

被引：7

作者：

Martsepp, Merike ^{[1
]}

Laas, Tonu ^{[1
]}

Laas, Katrin ^{[1
]}

Priimets, Jaanis ^{[1
,2
]}

Tokke, Siim ^{[1
]}

Mikli, Valdek ^{[3
]}

机构：

[1] Tallinn Univ, Sch Nat Sci & Hlth, Uus-Sadama 5, EE-10120 Tallinn, Estonia

[2] Tallinn Univ Technol, Estonian Maritime Acad, Kopli 101, EE-11712 Tallinn, Estonia

[3] Tallinn Univ Technol, Lab Optoelect Mat Phys, Ehitajate Tee 5, EE-19086 Tallinn, Estonia

来源：

CHAOS SOLITONS & FRACTALS | 2022年 / 156卷

关键词：

Multifractal analysis; Tungsten; Plasma; SEM; Optical microscope; Image processing; Image darkness; FRACTAL DIMENSION; GRAY-SCALE; SURFACE; PLASMA; BINARIZATION;

D O I：

10.1016/j.chaos.2022.111811

中图分类号：

O1 [数学];

学科分类号：

0701 ; 070101 ;

摘要：

In this study, four specimens of pure tungsten, which have been irradiated with a high-temperature plasma with 20, 40, 60, and 80 pulses, respectively, are considered. Scanning electron microscopy (SEM) and optical microscope (OM) images of these specimens are used to search for more suitable degrees of darkness for binarizing the images for multifractal analysis. The multifractal characteristics obtained from SEM and OM images are then compared for the same specimens. The study shows the application of multifractal analysis to SEM images is robust enough as the change of binarization level in a range of 30-70% leads to a change of multifractal characteristics about 0.5%. It has been found that the optimal binarization level for OM images is about 10%.(c) 2022 Published by Elsevier Ltd.

引用

页数：11

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