X-ray photoelectron spectroscopy;
plasma processing;
secondary ion mass spectroscopy;
D O I:
10.1016/j.surfcoat.2004.03.006
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
A Nylon-6,6 film has been treated using an atmospheric pressure air dielectric barrier discharge (DBD). The resultant surface modifications were studied using X-ray photoelectron spectroscopy (XPS), contact angle measurement and secondary ion mass spectrometry (SIMS). The surface oxidation arising in the DBD discharge was found to arise in two stages: in the first stage, the creation of the carbon sites singly bonded to oxygen is dominant, the second stage leads to further conversion of such lightly oxidised carbons to those more heavily oxidised. The marked increase found in the hydrophilicity of the surface post-treatment is in the main believed to be associated with the earlier outcome. Partial recovery of the surface contact angle values is found for the treated samples following extended storage in ambient air. The final contact angle obtained for the treated samples was similar to 50degrees, still reduced significantly from that of 83.5degrees for the untreated material. (C) 2004 Elsevier B.V. All rights reserved.
机构:
Korea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South KoreaKorea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South Korea
Han, S
;
Koh, SK
论文数: 0引用数: 0
h-index: 0
机构:Korea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South Korea
Koh, SK
;
Yoon, KH
论文数: 0引用数: 0
h-index: 0
机构:Korea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South Korea
机构:
Korea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South KoreaKorea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South Korea
Han, S
;
Koh, SK
论文数: 0引用数: 0
h-index: 0
机构:Korea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South Korea
Koh, SK
;
Yoon, KH
论文数: 0引用数: 0
h-index: 0
机构:Korea Inst Sci & Technol, Thin Film Technol Res Ctr, Seoul 130650, South Korea