Microscopic mechanism for mechanical polishing of diamond (110) surfaces

被引：36
作者：
Jarvis, MR
Perez, R
van Bouwelen, FM
Payne, MC
机构：
[1] Univ Cambridge, Cavendish Lab, Cambridge CB3 0HE, England
[2] Univ Autonoma Madrid, Dept Fis Teor Mat Condensada, E-28049 Madrid, Spain
[3] Univ Nijmegen, Fac Sci, NL-6525 ED Nijmegen, Netherlands
来源：
PHYSICAL REVIEW LETTERS | 1998年 / 80卷 / 16期
关键词：
D O I：
10.1103/PhysRevLett.80.3428
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
Mechanically induced degradation crf diamond, as occurs during polishing, is studied using total-energy pseudopotential calculations. The strong asymmetry in the rate of polishing between different directions on the diamond (110) surface is explained in terms of an atomistic mechanism for nanogroove formation. The postpolishing surface morphology and the nature of the polishing residue predicted by this mechanism are consistent with experimental evidence.
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收藏
页码：3428 / 3431
页数：4
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