Simple method for generating adjustable trains of picosecond electron bunches

A simple, passive method for producing an adjustable train of picosecond electron bunches is demonstrated. The key component of this method is an electron beam mask consisting of an array of parallel wires that selectively spoils the beam emittance. This mask is positioned in a high magnetic dispersion, low beta-function region of the beam line. The incoming electron beam striking the mask has a time/energy correlation that corresponds to a time/position correlation at the mask location. The mask pattern is transformed into a time pattern or train of bunches when the dispersion is brought back to zero downstream of the mask. Results are presented of a proof-of-principle experiment demonstrating this novel technique that was performed at the Brookhaven National Laboratory Accelerator Test Facility. This technique allows for easy tailoring of the bunch train for a particular application, including varying the bunch width and spacing, and enabling the generation of a trailing witness bunch.