Preparation of superhard amorphous carbon films with low internal stress

被引:27
|
作者
Weissmantel, S [1 ]
Reisse, G [1 ]
Rost, D [1 ]
机构
[1] Univ Appl Sci, Hsch Mittweida, D-09648 Mittweida, Germany
来源
SURFACE & COATINGS TECHNOLOGY | 2004年 / 188卷
关键词
tetrahedral amorphous carbon (ta-C); pulsed laser deposition (PLD); stress relaxation; mechanical properties;
D O I
10.1016/j.surfcoat.2004.08.070
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Tetrahedral amorphous carbon (ta-C) films were prepared by pulsed laser deposition using a 248-nm excimer laser wavelength and up to 45 J/cm(2) laser pulse energy fluence. Fluences above 6 J/cm(2) and mean kinetic energies of the ablated species above 30 eV, respectively, as well as substrate temperatures below 100 degreesC were found to be necessary for the formation of ta-C films with high sp(3) percentage. Such films are completely amorphous and have up to 85% sp(3) bonds. As-deposited films show high compressive stresses in the range of 8-10 GPa. The possibilities to reduce those stresses by means of thermal and pulsed laser annealing were investigated. We found that both methods allow the preparation of nearly stress-free diamond-like carbon films with several micrometers of thickness and good adherence to Si and WC hard metal substrates. The Vickers microhardness of those films was measured to be 55-65 GPa and the Young's modulus was measured to be 800-900 GPa by using a dynamic indentation method. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:268 / 273
页数:6
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