Wettability of poly(ethylene terephthalate) substrates modified by a two-step plasma process: Ultra water-repellent surface fabrication

被引：32

作者：

Teshima, K ^{[1
]}

Sugimura, H

Inoue, Y

Takai, O

Takano, A

机构：

[1] Dai Nippon Printing Co Ltd, Ctr Res & Dev, Adv Technol Lab, Kashiwa, Chiba 2770871, Japan

[2] Kyoto Univ, Grad Sch Engn, Dept Mat Sci & Engn, Kyoto 6068501, Japan

[3] Nagoya Univ, EcoTopia Sci Inst, Nagoya, Aichi 4648603, Japan

来源：

CHEMICAL VAPOR DEPOSITION | 2004年 / 10卷 / 06期

关键词：

D O I：

10.1002/cvde.200304181

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

Communication: The fabrication of ultra-water-repellent poly(ethylene terephthalate) substrates has been achieved by a two-step plasma process. First, appropriate nanotextures are prepared on the substrate through an oxygen plasma treatment, and then a hydrophobic layer is coated on the nanotextured surfaces with plasma-enhanced CVD using tetra methylsilane. The resulting modified substrates show ultra-water-repellent characteristics with a water contact angle greater than 150degrees (Figure).

引用

页码：295 / +

页数：4

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