Highly adhesive Pt-electrode films directly deposited on SiO2 by electron-cyclotron-resonance plasma sputtering

被引：3

作者：

Akazawa, Housei ^{[1
]}

机构：

[1] NTT Microsyst Integrat Labs, Atsugi, Kanagawa 2430198, Japan

来源：

SURFACE & COATINGS TECHNOLOGY | 2010年 / 204卷 / 11期

关键词：

Platinum; ECR plasma sputtering; DC-magnetron sputtering; Adhesion; Scratch test; Surface roughness; BEAM-ASSISTED DEPOSITION; CHEMICAL-VAPOR-DEPOSITION; MECHANICAL-PROPERTIES; PLATINUM FILM; THIN-FILMS; COATINGS; SUBSTRATE; PT/TI; TI; METALLIZATION;

D O I：

10.1016/j.surfcoat.2009.11.025

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Pt films directly deposited on SiO2 by electron-cyclotron-resonance (ECR) plasma sputtering and DC-magnetron sputtering have been compared in terms of their performance as electrodes. The DC-magnetron sputtered Pt film consisted of sharply (111) oriented crystallites, which was reflected in hexagonal crystallites observed in atomic force microscopy images. While ECR-sputtered Pt film was also (111) oriented, the X-ray diffraction rocking curve of the (111) peak was broader than that of the DC-magnetron sputtered film. The surface image revealed fine grains, thus having a flatter surface. A scratch test revealed that ECR-sputtered films had an adhesive strength about twice that of DC-magnetron-sputtered films, which was consistent with our tape-test results. Possible reasons for the different adhesion characteristics are discussed. (C) 2009 Elsevier B.V. All rights reserved.

引用

页码：1836 / 1841

页数：6

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