Low loss shallow-ridge silicon waveguides

被引：149

作者：

Dong, Po ^{[1
]}

Qian, Wei ^{[1
]}

Liao, Shirong ^{[1
]}

Liang, Hong ^{[1
]}

Kung, Cheng-Chih ^{[1
]}

Feng, Ning-Ning ^{[1
]}

Shafiiha, Roshanak ^{[1
]}

Fong, Joan ^{[1
]}

Feng, Dazeng ^{[1
]}

Krishnamoorthy, Ashok V. ^{[2
]}

Asghari, Mehdi ^{[1
]}

机构：

[1] Kotura Inc, Monterey Pk, CA 91754 USA

[2] Oracle, Sun Labs, San Diego, CA 92121 USA

来源：

OPTICS EXPRESS | 2010年 / 18卷 / 14期

关键词：

LEAKAGE PROPERTIES; PHOTONIC WIRES; FABRICATION; TECHNOLOGY; RESONATORS; OXIDATION; MODULATOR; GUIDANCE;

D O I：

10.1364/OE.18.014474

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate low loss shallow-ridge silicon waveguides with an average propagation loss of 0.274 +/- 0.008 dB/cm in the C-band (1530 nm - 1565 nm). These waveguides have a cross section of 0.25 mu m by 2 mu m and are fabricated by standard photolithography and dry etching. We also investigate a compact double-level taper which adiabatically couples light from these waveguides to silicon strip waveguides enabling tight bends. (C) 2010 Optical Society of America

引用

收藏

页码：14474 / 14479

页数：6

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