Absolute technique for measuring internal electric fields in InGaN/GaN light-emitting diodes by electroreflectance applicable to all crystal orientations

被引:2
|
作者
Tanikawa, Tomoyuki [1 ]
Shojiki, Kanako [1 ,3 ]
Katayama, Ryuji [1 ,4 ]
Kuboya, Shigeyuki [1 ]
Matsuoka, Takashi [1 ]
Honda, Yoshio [2 ]
Amano, Hiroshi [2 ]
机构
[1] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
[2] Nagoya Univ, Inst Mat & Syst Sustainabil, Ctr Integrated Res Future Elect, Nagoya, Aichi 4648603, Japan
[3] Mie Univ, Dept Elect & Elect Engn, Tsu, Mie 5148507, Japan
[4] Osaka Univ, Grad Sch Engn, Div Elect Elect & Informat Engn, Suita, Osaka 5650871, Japan
关键词
A-PLANE GAN; CHEMICAL-VAPOR-DEPOSITION; GALLIUM NITRIDE FILMS; SINGLE QUANTUM-WELLS; PIEZOELECTRIC FIELD; SAPPHIRE; HETEROSTRUCTURES; SUBSTRATE; CHARGE; MOVPE;
D O I
10.7567/APEX.10.082101
中图分类号
O59 [应用物理学];
学科分类号
摘要
The internal electric fields in III-polar (0001), N-polar (0001), and semipolar (1011) InGaN/GaN light-emitting diodes were investigated by electroreflectance (ER) spectroscopy. The ER spectra reflected the difference in the direction and strength of internal electric fields. Phase analyses of the ER signal revealed that only III-polar InGaN wells have the opposite direction of the internal electric field at zero bias voltage; this finding is in good agreement with the results of numerical analyses. Quantitative analyses of internal electric fields were conducted by the linewidth analyses of ER spectra. Our experimental results indicate that the absolute value of internal electric fields can be measured from ER spectra. (C) 2017 The Japan Society of Applied Physics
引用
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页数:4
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