Preparation of single-phase SnSe thin-films and modification of electrical properties via stoichiometry control for photovoltaic application

被引:51
作者
Jeong, Giuk [1 ]
Kim, Jekyung [1 ]
Gunawan, Oki [2 ]
Pae, Seong Ryul [1 ]
Kim, Soo Hyun [3 ]
Song, Jae Yong [4 ]
Lee, Yun Seog [2 ]
Shin, Byungha [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, 291 Daehak Ro, Daejeon 34141, South Korea
[2] IBM TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
[3] Yeungnam Univ, Dept Mat Sci & Engn, 280 Daehak Ro, Gyongsan 38541, Gyeongsangbuk D, South Korea
[4] Korea Res Inst Stand & Sci, 267 Gajeong Ro, Daejeon 34113, South Korea
基金
新加坡国家研究基金会;
关键词
Thin films; Inorganic materials; Electronic properties; Electronic band structure; Photoconductivity and photovoltaics; IV-VI COMPOUNDS; THERMAL EVAPORATION; SOLAR-CELLS; CU2ZNSNS4; FILMS; DEPOSITION; PRECURSORS; CRYSTALS; SPECTRA;
D O I
10.1016/j.jallcom.2017.06.094
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Single-phase SnSe thin films were prepared via thermal co-evaporation using a Se thermal cracker. By carefully tuning the stoichiometry of the SnSe, we found that the composition range of single phase SnSe is very narrow, a Se/Sn ratio of 0.95-0.99; outside of this range secondary phases (metallic Sn or SnSe2) formed. Electrical properties were found to be very sensitive to even small changes in the stoichiometry. Three orders of magnitude difference in the carrier concentration was observed within the stoichiometry range for single-phase SnSe, which can be explained by changes in the shallow level defect density. To further control carrier concentration, we introduced In and Sb as counter-dopants into the SnSe thin films and found that they were deep level donors with the ionization fraction of similar to 10(-4). Finally, we demonstrate the potential of SnSe thin films as an absorber layer in photovoltaic applications. Our study demonstrates the importance of fine-tuning stoichiometry of SnSe to achieve desired electrical properties. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码:474 / 481
页数:8
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