Electrodeposition and characterization of nanocrystalline cuprous oxide thin films on TiO2 films

被引：80

作者：

Tang, YW ^{[1
]}

Chen, ZG ^{[1
]}

Jia, ZJ ^{[1
]}

Zhang, LS ^{[1
]}

Li, JL ^{[1
]}

机构：

[1] Cent China Normal Univ, Inst Nanosci & Technol, Wuhan 430079, Peoples R China

来源：

MATERIALS LETTERS | 2005年 / 59卷 / 04期

关键词：

cuprous oxide films; electrodeposition; nanocrystalline; TiO2; film;

D O I：

10.1016/j.matlet.2004.09.040

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The grain size in cuprous oxide (Cu2O) thin films is a key to improve the performance of solar application devices. In this paper, electrochemical deposition of nanocrystalline Cu2O thin films on TiO2 films coated on transparent conducting optically (TCO) glass substrates by cathodic reduction of cupric acetate has been investigated. The deposition kinetics of nanocrystalline Cu2O thin films were studied and the parameters limiting the deposition of the films were determined. Pure Cu2O deposited at bath temperature between 0 and 30 T produced spherically shaped grains with 40similar to50 nm diameters which have not been reported previously. The effect of pH was studied and a solution with a pH between 5.5 and 6 was found to be best. The effect of annealing on bulk structure, electrical resistivity, and optical absorption of nanocrystalline Cu2O thin films was also studied and the results were discussed. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：434 / 438

页数：5

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