First-principles investigations of the dielectric properties of crystalline and amorphous Si3N4 thin films

被引:23
|
作者
Pham, T. Anh [1 ]
Li, Tianshu [1 ]
Shankar, Sadasivan [2 ]
Gygi, Francois [3 ,4 ]
Galli, Giulia [1 ,5 ]
机构
[1] Univ Calif Davis, Dept Chem, Davis, CA 95616 USA
[2] Intel Corp, Santa Clara, CA USA
[3] Univ Calif Davis, Dept Appl Sci, Davis, CA 95616 USA
[4] Univ Calif Davis, Dept Comp Sci, Davis, CA 95616 USA
[5] Univ Calif Davis, Dept Phys, Davis, CA 95616 USA
关键词
ab initio calculations; amorphisation; density functional theory; dielectric thin films; optical constants; permittivity; silicon compounds; SILICON-NITRIDE; ELECTRONIC-STRUCTURE;
D O I
10.1063/1.3303987
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have investigated the dielectric properties of silicon nitride thin films with thickness below 6 nm, by using density functional theory calculations. We find a substantial decrease in the static dielectric constant of crystalline films, as their size is reduced. The variation in the response in proximity of the surface plays a key role in the observed decrease. In addition, amorphization of the films may bring further reduction of both the static and optical dielectric constants.
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页数:3
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