Electronic states and chemical reactivity of Si(100)c(4 x 2) surface at low temperature studied by high resolution Si 2p core level photoelectron spectroscopy

被引:4
|
作者
Machida, S [1 ]
Nagao, M [1 ]
Yamamoto, S [1 ]
Kakefuda, Y [1 ]
Mukai, K [1 ]
Yamashita, Y [1 ]
Yoshinobu, J [1 ]
机构
[1] Univ Tokyo, Inst Solid State Phys, Kashiwa, Chiba 2778581, Japan
关键词
silicon; photoelectron spectroscopy; halides;
D O I
10.1016/S0039-6028(03)00177-8
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We have investigated the electronic states of clean and BF3 adsorbed Si(l 0 0) surfaces at low temperature by means of high resolution Si 2p photoelectron spectroscopy. The peak intensities of upper atom and lower atom of the asymmetric dimer in Si 2p spectra do not change even at 30 K compared with those at higher temperature up to 300 K, indicating that the dimer is asymmetric in the ground state. In order to investigate chemical reactivity of asymmetric dimer on Si(I 0 0), a typical Lewis acid molecule BF3 is adsorbed on Si(I 0 0). We have found that BF3 molecules are dissociated into BF2 and F on Si(I 0 0) and dissociated species (BF2 and F) are adsorbed predominantly on the up dimer atoms of the asymmetric dimers. (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:716 / 720
页数:5
相关论文
共 50 条
  • [21] Topmost-surface-sensitive Si-2p photoelectron spectra of clean Si(100)-2 x 1 measured with photoelectron Auger coincidence spectroscopy
    Kakiuchi, Takuhiro
    Hashimoto, Shogo
    Fujita, Narihiko
    Tanaka, Masatoshi
    Mase, Kazuhiko
    Nagaoka, Shin-ichi
    SURFACE SCIENCE, 2010, 604 (9-10) : L27 - L30
  • [22] Surface core-level shifts of Si(111)7x7: a critical evaluation of the Si 2p analysis
    Le Lay, G
    Cricenti, A
    Ottaviani, C
    Hakansson, C
    Perfetti, P
    Prince, KC
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1998, 88 : 711 - 715
  • [23] Photoemission study of Na growth on the Si(100)c(4x2) surface at low temperature
    Chao, YC
    Johansson, LSO
    Uhrberg, RIG
    SURFACE SCIENCE, 1997, 391 (1-3) : 237 - 244
  • [24] InP(100)-(2x4) surface electronic structure studied by angle-resolved photoelectron spectroscopy
    Huff, WRA
    Shimomura, M
    Sanada, N
    Kaneda, G
    Takeuchi, T
    Suzuki, Y
    Yeom, HW
    Abukawa, T
    Kono, S
    Fukuda, Y
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1998, 88 : 609 - 612
  • [25] Initial oxidation states on Si(001) surface induced by translational kinetic energy of O2 at room temperature studied by Si-2p core-level spectroscopy using synchrotron radiation
    Yoshigoe, A
    Teraoka, Y
    SURFACE SCIENCE, 2001, 482 : 189 - 195
  • [26] High-resolution core-level study of the Ca/Si(111)-(2 X 1) surface
    Sakamoto, K
    Takeyama, W
    Zhang, HM
    Uhrberg, RIG
    THIN SOLID FILMS, 2003, 428 (1-2) : 115 - 118
  • [27] Formation and stability of the Cu(110)+c(2x2)-Si surface alloy studied by high resolution XPS
    Rojas, C
    Palomares, FJ
    López, MF
    Goldoni, A
    Paolucci, G
    Martín-Gago, JA
    SURFACE SCIENCE, 2000, 454 (454) : 778 - 782
  • [28] CeO2 on Si(111) 7 X 7 and Si(111)-H 1 X 1, an interface study by high-resolution photoelectron spectroscopy
    Hirschauer, B
    Göthelid, M
    Janin, E
    Lu, H
    Karlsson, UO
    APPLIED SURFACE SCIENCE, 1999, 148 (3-4) : 164 - 170
  • [29] Surface-Site-Selective Study of Valence Electronic Structures of Clean Si(100)-2x1 Using Si-L23VV Auger Electron-Si-2p Photoelectron Coincidence Spectroscopy
    Kakiuchi, Takuhiro
    Hashimoto, Shogo
    Fujita, Narihiko
    Tanaka, Masatoshi
    Mase, Kazuhiko
    Nagaoka, Shin-ichi
    JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 2010, 79 (06)
  • [30] Core-level study of the K/Si(100)c(4x2) system: Beyond the room temperature saturation coverage
    Chao, YC
    Johansson, LSO
    Uhrberg, RIG
    SURFACE SCIENCE, 1997, 372 (1-3) : 64 - 70