Time Resolved Spectroscopic Characterization of a-C:H Deposition by Methane and Removal by Oxygen Inductively Coupled RF Plasma

被引：10

作者：

Biscan, M. ^{[1
]}

Kregar, Z. ^{[1
]}

Krstulovic, N. ^{[1
]}

Milosevic, S. ^{[1
]}

机构：

[1] Inst Phys, Zagreb 10000, Croatia

来源：

PLASMA CHEMISTRY AND PLASMA PROCESSING | 2010年 / 30卷 / 03期

关键词：

Methane plasma; Optical emission spectroscopy; Amorphous hydrogenated carbon; Oxygen plasma cleaning; Plasma sterilization; CARBON; FILMS;

D O I：

10.1007/s11090-010-9226-7

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

The deposition of amorphous hydrogenated carbon thin films by inductively coupled radio frequency (IC RF) pure methane plasma and its subsequent removal by IC RF pure oxygen plasma have been studied within a cylindrical glass tube. Both processes were simultaneously monitored by optical emission spectroscopy, light transmission through thin film deposits, temperature of the discharge tube and total gas pressure measurements. Comparing the time evolution of all parameters, various stages of oxygen plasma cleaning process were established. The transitions between E-mode and H-mode of plasma induced by the presence of cleaning products impurities were observed and discussed.

引用

收藏

页码：401 / 412

页数：12

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