perfluoroketone;
C5F10O;
electron attachment;
electrical insulation;
SF6;
replacement;
D O I:
10.1088/1361-6463/aad174
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
The electrical insulation properties of pure C5F10O and of C5F10O/N(2 )and C5F10O/CO2 mixtures are investigated in a pulsed Townsend setup. The electron rate and transport coefficients and the density-reduced critical electric field of these mixtures are obtained, and a synergy effect is observed in C5F10O/N-2 and C5F10O/CO2 mixtures. The total electron attachment cross section of C5F10O is estimated based on the attachment rate to C5F10O in dilutedC(5)F(10)O/N(2 )and C5F10O/CO2 mixtures.
机构:
ETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, SwitzerlandETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, Switzerland
Chachereau, A.
Rabie, M.
论文数: 0引用数: 0
h-index: 0
机构:
ETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, SwitzerlandETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, Switzerland
Rabie, M.
Franck, C. M.
论文数: 0引用数: 0
h-index: 0
机构:
ETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, SwitzerlandETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, Switzerland
机构:
ETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, SwitzerlandETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, Switzerland
Chachereau, A.
Rabie, M.
论文数: 0引用数: 0
h-index: 0
机构:
ETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, SwitzerlandETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, Switzerland
Rabie, M.
Franck, C. M.
论文数: 0引用数: 0
h-index: 0
机构:
ETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, SwitzerlandETH, Power Syst & High Voltage Labs, Phys Str 3, CH-8092 Zurich, Switzerland