Preparation and annealing effect on photoluminescent properties of Si/SiC thin films by alternate sputtering

被引:8
作者
Li, Jia-Jun [1 ]
Jia, Shi-Li [1 ]
Du, Xi-Wen [1 ]
Zhao, Nai-Qin [1 ]
机构
[1] Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China
基金
中国国家自然科学基金;
关键词
silicon; silicon carbide; sputtering; photoluminescence; transmission electron microscopy (TEM);
D O I
10.1016/j.surfcoat.2006.07.048
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Si/SiC composite films, namely, Si nano-particles in SiC matrix material, were prepared by using RF alternate sputtering technique and then annealed at high temperature from 1100 to 1400 degrees C. The photoluminescence (PL) phenomenon was observed in samples annealed over 1200 degrees C. The PL spectra show two emission bands at about 352 nm and 468 nm and the PL intensity increasing with temperature rising. The blue PL band at 468 nm is related to a quantum size effect of Si nanocrystallites, while the UV PL peak band at 352 urn may be originated from the presence of the Si-O-C bonds grown at high temperature. (C) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:5408 / 5411
页数:4
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