Orientation control of GaN {1 1 (2)over-bar 2} and {1 0 (1)over-bar (3)over-bar} grown on (1 0 (1)over-bar 0) sapphire by metal-organic vapor phase epitaxy

被引:45
|
作者
Ploch, Simon [1 ]
Frentrup, Martin [1 ]
Wernicke, Tim [2 ]
Pristovsek, Markus [1 ]
Weyers, Markus [2 ]
Kneissl, Michael [1 ,2 ]
机构
[1] Tech Univ Berlin, Inst Solid State Phys, D-10623 Berlin, Germany
[2] Leibniz Ferdinand Braun Inst Berlin, D-12489 Berlin, Germany
关键词
MOVPE; Single crystal structure; GaN; Nitrides; Sapphire; LIGHT-EMITTING-DIODES; M-PLANE SAPPHIRE; SEMIPOLAR; SUBSTRATE; FILMS;
D O I
10.1016/j.jcrysgro.2010.04.043
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
The growth of semipolar GaN on (1 0 (1) over bar 0) (m-plane) sapphire was investigated by metal-organic vapor phase epitaxy (MOVPE). Most of the layers were polycrystalline with (1 1 (2) over bar 2), {1 0 (1) over bar (3) over bar} and {1 0 (1) over bar 0} as the dominant surface orientations. For incomplete nitridation and recrystallization the {1 0 (1) over bar (3) over bar} orientation was dominant. However, the {1 0 (1) over bar (3) over bar} surface is rough due to twinned crystallites. Growth at lower temperatures and with reduced gas flow velocity results in predominantly {1 1 (2) over bar 2} oriented smooth layers. The orientation was also found to be influenced by the nitridation and recrystallization process. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:2171 / 2174
页数:4
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