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Orientation control of GaN {1 1 (2)over-bar 2} and {1 0 (1)over-bar (3)over-bar} grown on (1 0 (1)over-bar 0) sapphire by metal-organic vapor phase epitaxy
被引:45
|作者:
Ploch, Simon
[1
]
Frentrup, Martin
[1
]
Wernicke, Tim
[2
]
Pristovsek, Markus
[1
]
Weyers, Markus
[2
]
Kneissl, Michael
[1
,2
]
机构:
[1] Tech Univ Berlin, Inst Solid State Phys, D-10623 Berlin, Germany
[2] Leibniz Ferdinand Braun Inst Berlin, D-12489 Berlin, Germany
关键词:
MOVPE;
Single crystal structure;
GaN;
Nitrides;
Sapphire;
LIGHT-EMITTING-DIODES;
M-PLANE SAPPHIRE;
SEMIPOLAR;
SUBSTRATE;
FILMS;
D O I:
10.1016/j.jcrysgro.2010.04.043
中图分类号:
O7 [晶体学];
学科分类号:
0702 ;
070205 ;
0703 ;
080501 ;
摘要:
The growth of semipolar GaN on (1 0 (1) over bar 0) (m-plane) sapphire was investigated by metal-organic vapor phase epitaxy (MOVPE). Most of the layers were polycrystalline with (1 1 (2) over bar 2), {1 0 (1) over bar (3) over bar} and {1 0 (1) over bar 0} as the dominant surface orientations. For incomplete nitridation and recrystallization the {1 0 (1) over bar (3) over bar} orientation was dominant. However, the {1 0 (1) over bar (3) over bar} surface is rough due to twinned crystallites. Growth at lower temperatures and with reduced gas flow velocity results in predominantly {1 1 (2) over bar 2} oriented smooth layers. The orientation was also found to be influenced by the nitridation and recrystallization process. (C) 2010 Elsevier B.V. All rights reserved.
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页码:2171 / 2174
页数:4
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