In situ construction of oxygen-vacancy-rich Bi0@Bi2WO6-x microspheres with enhanced visible light photocatalytic for NO removal

被引:63
作者
Xie, Xiaoqian [1 ]
Hassan, Qadeer-Ul [1 ]
Lu, Huan [2 ]
Rao, Fei [1 ]
Gao, Jianzhi [1 ]
Zhu, Gangqiang [1 ]
机构
[1] Shaanxi Normal Univ, Sch Phys & Informat Technol, Xian 710062, Peoples R China
[2] Shaanxi Normal Univ, Sch Geog & Tourism, Xian 710062, Peoples R China
基金
中国国家自然科学基金;
关键词
Bi2WO6; microspheres; Oxygen vacancies; Bi metal; Photocatalytic reaction; In situ FTIR; BI METAL; BI2WO6; REDUCTION; CO2; NANOPARTICLES; PERFORMANCE; AU;
D O I
10.1016/j.cclet.2020.10.002
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Surface oxygen vacancy defects and metal deposition on semiconductor photocatalysts play a critical role in photocatalytic reactions. In this work, oxygen-deficient Bi2WO6 microspheres have been prepared by a facile ethylene glycol-assisted solvothermal method. Bi-0 nanoparticles were reduced by in situ thermaltreatment on Bi2WO6 microspheres to obtain Bi-0@Bi2WO6-x, as well as maintaining the oxygen vacancies (OVs) under N-2 atmosphere. Afterwards, photocatalytic NO oxidation removal activities of these photocatalysts were investigated under visible light irradiation and Bi-0@Bi2WO6-x shows the best NO removal activity than other samples. The photogenerated charge separation and transfer are promoted by Bi-0 nanoparticles deposited on the surface of semiconductor catalysts. OVs defects promote the activation of reactants (H2O and O-2), thereby enhancing the formation of the active substance. Moreover, both OVs defects and Bi-0 metal have the characteristics of extending light absorption and enhancing the efficient utilization of solar energy. Besides, the photocatalytic NO oxidation mechanism of Bi-0@Bi2WO6-x was investigated by in situ FTIR spectroscopy for reaction intermediates and final products. This work furnishes insight into the synthesis strategy and the underlying photocatalytic mechanism of the surface-modified Bi-0@Bi2WO6-x, composite for pollutants removal. (C) 2021 Chinese Chemical Society and Institute of Materia Medica, Chinese Academy of Medical Sciences. Published by Elsevier B.V. All rights reserved.
引用
收藏
页码:2038 / 2042
页数:5
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