Advanced thin-film silicon-on-sapphire technology: Microwave circuit applications

被引:70
|
作者
Johnson, RA
de la Houssaye, PR
Chang, CE
Chen, PF
Wood, ME
Garcia, GA
Lagnado, I
Asbeck, PM
机构
[1] Univ Calif San Diego, Dept Elect & Comp Engn, La Jolla, CA 92093 USA
[2] SPAWAR Syst Ctr, San Diego, CA 92152 USA
关键词
CMOSFET's; microwave integrated circuits; silicon-on-insulator technology; thin-film inductors; transceiver;
D O I
10.1109/16.669525
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reviews the prospects of thin-film silicon-on-sapphire (TFSOS) CMOS technology in microwave applications in the 1-5 GHz regime and beyond and presents the first demonstration of microwave integrated circuits based on this technology. MOSFET's optimized for microwave use, with 0.5-mu m optically defined gate lengths and a T-gate structure, have f(t) values of 25 GHz (14 GHz) and f(max) values of 66 GHz (41 GHz) for n-channel (p-channel) devices and have noise figure values below 1 dB at 2 GHz, some of the best reported performance characteristics of any silicon-based MOSFET's to date. On-chip spiral inductors exhibit quality factors above ten. Circuit performance compares favorably with that of other CMOS-based technologies and approach performance levels similar to those obtained by silicon bipolar technologies. The results demonstrate the significant potential of this technology for microwave applications.
引用
收藏
页码:1047 / 1054
页数:8
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