Comparative Analysis of Negative Capacitance Junctionless and Inversion Mode Transistors for Low Power Applications

被引:1
作者
Gupta, Manish [1 ]
Hu, Vita Pi-Ho [1 ]
机构
[1] Natl Cent Univ, Dept Elect Engn, Taoyuan, Taiwan
来源
2019 IEEE SOI-3D-SUBTHRESHOLD MICROELECTRONICS TECHNOLOGY UNIFIED CONFERENCE (S3S) | 2019年
关键词
Negative Capacitance; Junctionless; Inversion Mode; Double Gate; Low Power;
D O I
10.1109/S3S46989.2019.9320675
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this work, through calibrated simulations, comparative analysis of n-type Negative Capacitance (NC) Junctionless (JL) and Inversion Mode (IM) transistor is performed for Low Power (LP) applications. Through systematic metholdology and physical insights, it is highlighted that NC JL device exhbits negative internal gate voltage (V-int) at zero applied external gate bias (V-gs), which is benefical to achieve significantly lower value of off-current (I-off) than NC IM device for LP applications. It is demonstrated that negative V-int in NC JL device can further be utilized to lower the gate workfunction to mid-gap level while achieving the and I-on similar to 1.3 mA/mu m at lower I-off similar to 10 pA/mu m. The work showcases the opportunites to achieve the International Roadmap for Devices and Systems (IRDS) traget at gate length (L-g) of 20 nm and drain bias (V-ds) of 0.1 V for designing LP systems and circuits using NC JL transistor.
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页数:2
相关论文
共 13 条
[1]  
[Anonymous], 2017, SentaurusDevice User Guide
[2]   Identification of the ferroelectric switching process and dopant-dependent switching properties in orthorhombic HfO2: A first principles insight [J].
Clima, S. ;
Wouters, D. J. ;
Adelmann, C. ;
Schenk, T. ;
Schroeder, U. ;
Jurczak, M. ;
Pourtois, G. .
APPLIED PHYSICS LETTERS, 2014, 104 (09)
[3]  
Colinge JP, 2010, NAT NANOTECHNOL, V5, P225, DOI [10.1038/nnano.2010.15, 10.1038/NNANO.2010.15]
[4]   Reduced electric field in junctionless transistors [J].
Colinge, Jean-Pierre ;
Lee, Chi-Woo ;
Ferain, Isabelle ;
Akhavan, Nima Dehdashti ;
Yan, Ran ;
Razavi, Pedram ;
Yu, Ran ;
Nazarov, Alexei N. ;
Doriac, Rodrigo T. .
APPLIED PHYSICS LETTERS, 2010, 96 (07)
[5]   Impact of Work Function Variation, Line-Edge Roughness, and Ferroelectric Properties Variation on Negative Capacitance FETs [J].
Hu, Vita Pi-Ho ;
Chiu, Pin-Chieh ;
Lu, Yi-Chun .
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY, 2019, 7 (01) :295-302
[6]   Revisited parameter extraction methodology for electrical characterization of junctionless transistors [J].
Jeon, D. -Y. ;
Park, S. J. ;
Mouis, M. ;
Berthome, M. ;
Barraud, S. ;
Kim, G. -T. ;
Ghibaudo, G. .
SOLID-STATE ELECTRONICS, 2013, 90 :86-93
[7]   Simulation-based study of negative capacitance double-gate junctionless transistors with ferroelectric gate dielectric [J].
Jiang, Chunsheng ;
Liang, Renrong ;
Wang, Jing ;
Xu, Jun .
SOLID-STATE ELECTRONICS, 2016, 126 :130-135
[8]  
Karbasian G., 2017, IEEE VLSI TSA, P1
[9]   Impact of Gaussian Doping Profile and Negative Capacitance Effect on Double-Gate Junctionless Transistors (DGJLTs) [J].
Mehta, Hema ;
Kaur, Harsupreet .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (07) :2699-2706
[10]   Numerical Investigation of Short-ChannelEffects n Negative Capacitance MFIS and MFMIS Transistors: Subthreshold Behavior [J].
Pahwa, Girish ;
Agarwal, Amit ;
Chauhan, Yogesh Singh .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 2018, 65 (11) :5130-5136