Efficient focusing of hard x rays to 25 nm by a total reflection mirror

被引：166
作者：
Mimura, Hidekazu
Yumoto, Hirokatsu
Matsuyama, Satoshi
Sano, Yasuhisa
Yamamura, Kazuya
Mori, Yuzo
Yabashi, Makina
Nishino, Yoshinori
Tamasaku, Kenji
Ishikawa, Tetsuya
Yamauchi, Kazuto
机构：
[1] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan
[2] Osaka Univ, Grad Sch Engn, Ctr Ultra Precis Sci & Technol, Suita, Osaka 5650871, Japan
[3] JASRI, SPRING8, Sayo, Hyogo 6795198, Japan
[4] RIKEN, SPRING8, Sayo, Hyogo 6795198, Japan
来源：
APPLIED PHYSICS LETTERS | 2007年 / 90卷 / 05期
关键词：
D O I：
10.1063/1.2436469
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
Nanofocused x rays are indispensable because they can provide high spatial resolution and high sensitivity for x-ray nanoscopy/spectroscopy. A focusing system using total reflection mirrors is one of the most promising methods for producing nanofocused x rays due to its high efficiency and energy-tunable focusing. The authors have developed a fabrication system for hard x-ray mirrors by developing elastic emission machining, microstitching interferometry, and relative angle determinable stitching interferometry. By using an ultraprecisely figured mirror, they realized hard x-ray line focusing with a beam width of 25 nm at 15 keV. The focusing test was performed at the 1-km-long beamline of SPring-8. (c) 2007 American Institute of Physics.
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页数：3
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