On the data analysis of light-biased photoconductance decay measurements

被引:40
作者
Aberle, AG [1 ]
Schmidt, J [1 ]
Brendel, R [1 ]
机构
[1] MAX PLANCK INST FESTKORPERFORSCH, D-70569 STUTTGART, GERMANY
关键词
D O I
10.1063/1.360990
中图分类号
O59 [应用物理学];
学科分类号
摘要
The use of bias light is common practice today in photoconductance decay (PCD) measurements to analyze semiconductor samples with injection-level dependent recombination parameters (i.e., surface recombination velocity and/or bulk lifetime). Recently, it has been shown on theoretical grounds that the previously reported recombination parameters from light-biased PCD experiments are not the actual properties of the investigated sample, but so-called differential recombination parameters [R. Brendel, Appl. Phys. A 60, 523 (1995)]. In the present article the theory relevant to light-biased PCD measurements is discussed in detail and subsequently applied to monocrystalline silicon wafers with nitride and oxide passivated surfaces in order to verify the deviations between the differential and actual surface recombination velocities. Special emphasis is paid to the experimental fact that the injection level cannot be reduced below a minimum value due to signal-to-noise problems. (C) 1996 American Institute of Physics.
引用
收藏
页码:1491 / 1496
页数:6
相关论文
共 20 条
[1]  
Aberle A., 1991, Tenth E.C. Photovoltaic Solar Energy Conference. Proceedings of the International Conference, P631
[2]   INJECTION-LEVEL DEPENDENT SURFACE RECOMBINATION VELOCITIES AT THE SILICON-PLASMA SILICON-NITRIDE INTERFACE [J].
ABERLE, AG ;
LAUINGER, T ;
SCHMIDT, J ;
HEZEL, R .
APPLIED PHYSICS LETTERS, 1995, 66 (21) :2828-2830
[3]   IMPACT OF ILLUMINATION LEVEL AND OXIDE PARAMETERS ON SHOCKLEY-READ-HALL RECOMBINATION AT THE SI-SIO2 INTERFACE [J].
ABERLE, AG ;
GLUNZ, S ;
WARTA, W .
JOURNAL OF APPLIED PHYSICS, 1992, 71 (09) :4422-4431
[4]  
[Anonymous], P 12 EUR PHOT SOL EN
[5]  
[Anonymous], 1985, 18 IEEE PHOT SPEC C
[6]   NUMERICAL MODELING OF TEXTURED SILICON SOLAR-CELLS USING PC-1D [J].
BASORE, PA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1990, 37 (02) :337-343
[7]   NOTE ON THE INTERPRETATION OF INJECTION-LEVEL-DEPENDENT SURFACE RECOMBINATION VELOCITIES [J].
BRENDEL, R .
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1995, 60 (05) :523-524
[8]   DETERMINATION OF SI-SIO2 INTERFACE RECOMBINATION PARAMETERS USING A GATE-CONTROLLED POINT-JUNCTION DIODE UNDER ILLUMINATION [J].
GIRISCH, RBM ;
MERTENS, RP ;
DEKEERSMAECKER, RF .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1988, 35 (02) :203-222
[9]   INJECTION-LEVEL-DEPENDENT RECOMBINATION VELOCITIES AT THE SI-SIO2 INTERFACE FOR VARIOUS DOPANT CONCENTRATIONS [J].
GLUNZ, SW ;
SPROUL, AB ;
WARTA, W ;
WETTLING, W .
JOURNAL OF APPLIED PHYSICS, 1994, 75 (03) :1611-1615
[10]  
GLUNZ SW, 1994, 12TH P EUR PHOT SOL, P492