In this paper a simple analytical model of the drain current of the junctionless double gate junctionless MOSFET with a variable barrier height has been presented. Band non-parabolicity is also assumed to increase the efficacy of the proposed model, applicable for the ultrathin nano devices. Variable barrier height uses intra band tunneling to enhance the I-ON/I-OFF by reducing the off current of the device significantly. Also lower sub-threshold slope can be achieved using this proposed device structure. Simulation shows that the proposed data is matched with the simulated data with high accuracy.
机构:
STMicroelectronics, F-38926 Crolles, France
Inst Microelect Electromagnetism & Photon, F-38016 Grenoble, FranceSTMicroelectronics, F-38926 Crolles, France
Hiblot, Gaspard
Mugny, Gabriel
论文数: 0引用数: 0
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机构:
STMicroelectronics, F-38926 Crolles, France
CEA LETI, F-38054 Grenoble, France
IEMN, ISEN Dept, F-59046 Lille, FranceSTMicroelectronics, F-38926 Crolles, France
机构:
STMicroelectronics, F-38926 Crolles, France
Inst Microelect Electromagnetism & Photon, F-38016 Grenoble, FranceSTMicroelectronics, F-38926 Crolles, France
Hiblot, Gaspard
Mugny, Gabriel
论文数: 0引用数: 0
h-index: 0
机构:
STMicroelectronics, F-38926 Crolles, France
CEA LETI, F-38054 Grenoble, France
IEMN, ISEN Dept, F-59046 Lille, FranceSTMicroelectronics, F-38926 Crolles, France