High-throughput three-dimensional lithographic microfabrication

被引：71
作者：
Kim, Daekeun [1 ]
So, Peter T. C. [1 ,2 ]
机构：
[1] MIT, Dept Mech Engn, Cambridge, MA 02139 USA
[2] MIT, Dept Biol Engn, Cambridge, MA 02139 USA
来源：
OPTICS LETTERS | 2010年 / 35卷 / 10期
关键词：
MULTIPHOTON LITHOGRAPHY; PHOTONIC CRYSTALS; NANOSTRUCTURES;
D O I：
10.1364/OL.35.001602
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A 3D lithographic microfabrication process has been developed that is high throughput, scalable, and capable of producing arbitrary patterns. It offers the possibility for industrial scale manufacturing of 3D microdevices such as photonic crystals, tissue engineering scaffolds, and microfluidics chips. This method is based on depth-resolved wide-field illumination by temporally focusing femtosecond light pulses. We characterized the axial resolution of this technique, and the result is consistent with the theoretical prediction. As proof-of-concept experiments, we demonstrated photobleaching of 3D resolved patterns in a fluorescent medium and fabricating 3D microstructures with SU-8 photoresist. (C) 2010 Optical Society of America
引用
收藏
页码：1602 / 1604
页数：3
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