In situ measurement on ultraviolet dielectric components by a pulsed top-hat beam thermal lens

被引:25
作者
Li, BC [1 ]
Martin, S [1 ]
Welsch, E [1 ]
机构
[1] Univ Jena, Inst Opt & Quantenelekt, D-07743 Jena, Germany
关键词
D O I
10.1364/AO.39.004690
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
A simple and sensitive mode-mismatched thermal lens (TL) technique with a pulsed top-hat beam excitation and a near-field detection scheme is developed to measure in situ the thermoelastic and the thermooptical responses of ultraviolet (UV) dielectric coatings as well as bulk materials under excimer laser (193- or 248-nm) irradiations. Owing to its high sensitivity, the TL technique can be used for measurements at fluences far below the laser-induced damage threshold (LIDT). We report on the measurement of both linear and nonlinear absorption of the UV dielectric coatings and bulk materials as well as the investigation of time-resolved predamage phenomena, such as laser conditioning of highly reflective dielectric coatings and irradiation-induced changes of a coating's various properties. The pulsed TL technique is also a convenient technique for accurate measurement of the LIDT of dielectric coatings and for distinguishing different damage mechanisms: thermal-stress-induced damage or melting-induced damage. (C) 2000 Optical Society of America OCIS codes: 120.6810, 140.3440, 310.6870.
引用
收藏
页码:4690 / 4697
页数:8
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