Digital phase-shift modulation for an isolation buffer in silicon-on-sapphire CMOS

被引:0
|
作者
Culurciello, Eugenio [1 ]
Pouliquen, P. [2 ]
Andreou, A. G. [2 ]
机构
[1] Yale Univ, New Haven, CT 06520 USA
[2] Johns Hopkins Univ, Elect & Comp Engn, Baltimore, MD 21218 USA
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中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
We designed and fabricated a 4-channels digital isolation amplifier in a 0.5 mu m Silicon-on-Sapphire technology. The isolation device was fabricated on a single die, taking advantage of the isolative properties of the sapphire substrate. The individual isolation channels can operate in excess of 40Mbps using digital phase-shift-keying modulation. Modulation of the input signal is used to increase immunity to errors at low input data rates. The device can tolerate ground bounces of 1V/mu s and isolate more than 800V. The device uses N+1 capacitors for N channels as opposed to 2N of previous implementations, thus minimizing the coupling silicon area and increasing reliability. Typical applications are in harsh industrial environments, transportation, medical and life-critical systems.
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页码:3710 / +
页数:2
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