Role of oxygen concentrations on structural and optical properties of RF magnetron sputtered ZnO thin films

被引：7
|
作者：
Otieno, Francis [1 ,2 ,5 ]
Airo, Mildred [3 ]
Ganetsos, Theodore [4 ]
Erasmus, Rudolph M. [1 ,2 ]
Billing, David G. [1 ,3 ]
Quandt, Alexander [1 ,2 ,5 ]
Wamwangi, Daniel [1 ,2 ,5 ]
机构：
[1] Univ Witwatersrand Wits, Mat Energy Res Grp, Private Bag 3, ZA-2050 Johannesburg, South Africa
[2] Univ Witwatersrand Wits, Mat Phys Res Inst, Sch Phys, Private Bag 3, ZA-2050 Johannesburg, South Africa
[3] Univ Witwatersrand Wits, Sch Chem, Private Bag 3, ZA-2050 Johannesburg, South Africa
[4] Univ West Attica, Perou Ralli & Thevon 250, Egaleo, Greece
[5] Hist Museum Phys & Study & Res Ctr Enrico Fermi, I-00184 Rome, Italy
来源：
OPTICAL AND QUANTUM ELECTRONICS | 2019年 / 51卷 / 11期
基金：
新加坡国家研究基金会;
关键词：
Zinc oxide; Photo-luminescence; Thin films; Raman; ZINC-OXIDE; PARTIAL-PRESSURE; PLASMA; GROWTH;
D O I：
10.1007/s11082-019-2076-5
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We report an investigation on the effect of oxygen flow rate on the structural and optical properties of zinc oxide thin films prepared by RF magnetron sputtering. The structural measurements were carried using grazing incidence X-ray diffraction, atomic force microscopy and Raman spectroscopy. The role of oxygen partial pressure on the crystallinity, the surface morphology and vibrational modes has been established. The optical properties of the films were investigated using FR-Basic-VIS/NIR fitted with FR-Monitor software for film thickness, refractive index and color determination. The film thickness is observed to increase when oxygen is introduced at 4 sccm but eventual decrease with increase in the flow rate an indication of initial increase in rate of deposition followed by reduction. Elaborate explanations of these trends are provided.
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收藏
页数：13
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