Comparison of anionic surfactants dodecylbenzene sulfonic acid and 1,2,4-triazole for inhibition of Co corrosion and study of the mechanism for passivation of the Co surface by dodecylbenzene sulfonic acid

被引:35
作者
Cheng, Yuanshen
Wang, Chenwei
Wang, Shengli [1 ]
Zeng, Nengyuan
Lei, Shuangshuang
机构
[1] Hebei Univ Technol, Sch Elect Informat Engn, Tianjin 300130, Peoples R China
基金
中国国家自然科学基金;
关键词
Cobalt; Corrosion inhibition; Electrochemical techniques; Quantum chemical calculations; MILD-STEEL; SLURRY ADDITIVES; CARBON-STEEL; ADSORPTION; COBALT; PERFORMANCE; CHLORIDE; FILMS; BASE; CMP;
D O I
10.1016/j.molliq.2022.118792
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In view of the shortcomings of the corrosion inhibitor in the Co bulk CMP process, the corrosion inhibition efficiency is low, and biological reduction is not easy. In this paper, a low-cost, easily degradable anionic surfactant, dodecylbenzene sulfonic acid (DBSA), is introduced as an inhibitor of Co, and the corrosion inhibition performance is compared with the commonly used inhibitor 1,2,4-triazole (TAZ) by corrosion rate tests, electrochemical methods, quantum chemical parameter calculations and optical/scanning electron microscopy (SEM) images. The results show that DBSA exhibits higher corrosion inhibition per-formance at the same concentration. This is attributed to the higher activity of DBSA molecules, which makes them more easily adsorb on the Co surface and form a denser film through physical and chemical adsorption. The X-ray photoelectron spectroscopy (XPS) results demonstrate that the addition of DBSA effectively prevents the oxidation of fresh Co to Co2+, thereby inhibiting the complexation reaction and improving the quality of the surface. (c) 2022 Elsevier B.V. All rights reserved.
引用
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页数:12
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