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Comparison of anionic surfactants dodecylbenzene sulfonic acid and 1,2,4-triazole for inhibition of Co corrosion and study of the mechanism for passivation of the Co surface by dodecylbenzene sulfonic acid
被引:35
作者:
Cheng, Yuanshen
Wang, Chenwei
Wang, Shengli
[1
]
Zeng, Nengyuan
Lei, Shuangshuang
机构:
[1] Hebei Univ Technol, Sch Elect Informat Engn, Tianjin 300130, Peoples R China
基金:
中国国家自然科学基金;
关键词:
Cobalt;
Corrosion inhibition;
Electrochemical techniques;
Quantum chemical calculations;
MILD-STEEL;
SLURRY ADDITIVES;
CARBON-STEEL;
ADSORPTION;
COBALT;
PERFORMANCE;
CHLORIDE;
FILMS;
BASE;
CMP;
D O I:
10.1016/j.molliq.2022.118792
中图分类号:
O64 [物理化学(理论化学)、化学物理学];
学科分类号:
070304 ;
081704 ;
摘要:
In view of the shortcomings of the corrosion inhibitor in the Co bulk CMP process, the corrosion inhibition efficiency is low, and biological reduction is not easy. In this paper, a low-cost, easily degradable anionic surfactant, dodecylbenzene sulfonic acid (DBSA), is introduced as an inhibitor of Co, and the corrosion inhibition performance is compared with the commonly used inhibitor 1,2,4-triazole (TAZ) by corrosion rate tests, electrochemical methods, quantum chemical parameter calculations and optical/scanning electron microscopy (SEM) images. The results show that DBSA exhibits higher corrosion inhibition per-formance at the same concentration. This is attributed to the higher activity of DBSA molecules, which makes them more easily adsorb on the Co surface and form a denser film through physical and chemical adsorption. The X-ray photoelectron spectroscopy (XPS) results demonstrate that the addition of DBSA effectively prevents the oxidation of fresh Co to Co2+, thereby inhibiting the complexation reaction and improving the quality of the surface. (c) 2022 Elsevier B.V. All rights reserved.
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