Thin films of ferroelectrics made by pulsed laser deposition for optoelectronic applications

被引:0
|
作者
Chrisey, DB [1 ]
Knauss, LA [1 ]
Horwitz, JS [1 ]
Auyeung, RCY [1 ]
Knies, D [1 ]
Grabowski, KS [1 ]
Donovan, EP [1 ]
McCallion, K [1 ]
Johnstone, W [1 ]
机构
[1] USN,RES LAB,WASHINGTON,DC 20375
来源
ADVANCED LASER PROCESSING OF MATERIALS - FUNDAMENTALS AND APPLICATIONS | 1996年 / 397卷
关键词
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:193 / 198
页数:6
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