Defect and Fault Modeling Framework for STT-MRAM Testing

被引:15
作者
Wu, Lizhou [1 ]
Rao, Siddharth [6 ]
Taouil, Mottaqiallah [1 ]
Medeiros, Guilherme Cardoso [2 ]
Fieback, Moritz [2 ]
Marinissen, Erik Jan [7 ]
Kar, Gouri Sankar [7 ]
Hamdioui, Said [3 ,4 ,5 ]
机构
[1] Delft Univ Technol, Comp Engn Lab, NL-2628 CD Delft, Netherlands
[2] Delft Univ Technol, NL-2628 CD Delft, Netherlands
[3] Delft Univ Technol, Dependable & Emerging Comp Technol, NL-2628 CD Delft, Netherlands
[4] Delft Univ Technol, Quantum & Comp Engn Dept, NL-2628 CD Delft, Netherlands
[5] Delft Univ Technol, Comp Engn Lab CE Lab, NL-2628 CD Delft, Netherlands
[6] IMEC, Memory Technol, B-3001 Leuven, Belgium
[7] IMEC, B-3001 Louvain, Belgium
关键词
Magnetic tunneling; Switches; Resistors; Multiprotocol label switching; Magnetic anisotropy; Magnetization; Saturation magnetization; STT-MRAM; manufacturing defects; fault models; test development; TUNNEL-JUNCTION STACKS; RESISTIVE-OPEN; COMPACT MODEL; BREAKDOWN; DESIGN;
D O I
10.1109/TETC.2019.2960375
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
STT-MRAM mass production is around the corner as major foundries worldwide invest heavily on its commercialization. To ensure high-quality STT-MRAM products, effective yet cost-efficient test solutions are of great importance. This article presents a systematic device-aware defect and fault modeling framework for STT-MRAM to derive accurate fault models which reflect the physical defects appropriately, and thereafter optimal and high-quality test solutions. An overview and classification of manufacturing defects in STT-MRAMs are provided with an emphasis on those related to the fabrication of magnetic tunnel junction (MTJ) devices, i.e., the data-storing elements. Defects in MTJ devices need to be modeled by adjusting the affected technology parameters and subsequent electrical parameters to fully capture the defect impact on both the device's electrical and magnetic properties, whereas defects in interconnects can be modeled as linear resistors. In addition, a complete single-cell fault space and nomenclature are defined, and a systematic fault analysis methodology is proposed. To demonstrate the use of the proposed framework, resistive defects in interconnect and pinhole defects in MTJ devices are analyzed for a single 1T-1MTJ memory cell. Test solutions for detecting these defects are also discussed.
引用
收藏
页码:707 / 723
页数:17
相关论文
共 66 条
  • [1] Ahmad I., 2017, ION IMPLANTATION RES, P67, DOI 10.5772/67760
  • [2] [Anonymous], 2012, P INT EL DEV M, DOI [10.1109/iedm.2012.6479128, DOI 10.1109/IEDM.2012.6479128]
  • [3] [Anonymous], 2012, PROC INT ELECT DEVIC, DOI DOI 10.1109/IEDM.2012.6479127
  • [4] [Anonymous], 2001, TESTING MULTIPORT ME
  • [5] Magnetoresistive Random Access Memory
    Apalkov, Dmytro
    Dieny, Bernard
    Slaughter, J. M.
    [J]. PROCEEDINGS OF THE IEEE, 2016, 104 (10) : 1796 - 1830
  • [6] A Complete Resistive-Open Defect Analysis for Thermally Assisted Switching MRAMs
    Azevedo, Joao
    Virazel, Arnaud
    Bosio, Alberto
    Dilillo, Luigi
    Girard, Patrick
    Todri-Sanial, Aida
    Alvarez-Herault, Jeremy
    Mackay, Ken
    [J]. IEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMS, 2014, 22 (11) : 2326 - 2335
  • [7] Bishnoi R., 2014, 2014 DES AUT TEST EU, P1, DOI DOI 10.7873/DATE.2014.193
  • [8] STT MRAM patterning challenges
    Boullart, Werner
    Radisic, Dunja
    Paraschiv, Vasile
    Cornelissen, Sven
    Manfrini, Mauricio
    Yatsuda, Koichi
    Nishimura, Eiichi
    Ohishi, Tetsuya
    Tahara, Shigeru
    [J]. ADVANCED ETCH TECHNOLOGY FOR NANOPATTERNING II, 2013, 8685
  • [9] Bushnell M., 2004, Essentials of electronic testing for digital, memory and mixed-signal VLSI circuits, V17
  • [10] Recent Technology Advances of Emerging Memories
    Chen, Yiran
    Li, Hai
    Bayram, Ismail
    Eken, Enes
    [J]. IEEE DESIGN & TEST, 2017, 34 (03) : 8 - 22