High-speed deposition of zirconia films by laser-induced plasma CVD

被引：30

作者：

Goto, T ^{[1
]}

机构：

[1] Tohoku Univ, Mat Res Inst, Sendai, Miyagi 9808577, Japan

来源：

SOLID STATE IONICS | 2004年 / 172卷 / 1-4期

关键词：

yttria-stabilized zirconia; CVD; plasma CVD; laser CVD; deposition rate; columnar structure;

D O I：

10.1016/j.ssi.2004.02.034

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Chemical vapor deposition (CVD) has been commonly applied to prepare thin films. However, the application of CVD can be expanded to thick coatings such as thermal barrier coatings (TBCs) by accelerating deposition rates. In this paper, the recent development of high-speed deposition for yttria-stabilized zirconia (YSZ) films by conventional thermal CVD and plasma-enhanced CVD (PE-CVD) has been briefly reviewed. A laser CVD (LCVD) process has been recently developed attaining an extremely high deposition rate of 660 mum/h. Plasma emerged during the laser CVD, and the relating plasma diagnosis is described. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：225 / 229

页数：5

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