Field-emission characteristics of diamond-like amorphous carbon films deposited by mixed gas (N2 or H2) controlled i-C4H10 supermagnetron plasma

被引：5
作者：
Kinoshita, Haruhisa [1 ]
Yamashita, Manabu. [1 ]
机构：
[1] Shizuoka Univ, Res Inst Elect, Hamamatsu, Shizuoka 4328011, Japan
来源：
THIN SOLID FILMS | 2007年 / 515卷 / 12期
关键词：
diamond-like amorphous carbon; field emission; chemical vapor deposition; supermagnetron plasma;
D O I：
10.1016/j.tsf.2006.10.055
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Diamond-like amorphous carbon (DAC) films were deposited for field-emission application using supermagnetron plasma by mixing N-2 or H-2 in i-C4H10 gas at the upper and lower electrode rf powers (UPRF/LORF) of 800 W/100-800 W. At an 800 W/800 W, the N-2 (0-80%) gas-mixed DAC films showed an emission threshold electric field (E-TH) of 19 V/mu m. At the 800 W/100 W, the H-2 (20%) gas-mixed DAC film showed low E-TH's of 13 V/mu m, respectively. The moderate reduction of CC and CN double bonds by the decrease of LORF from 800 W to 100 W was found to be effective to lower E-TH. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码：5142 / 5146
页数：5
相关论文
共 26 条
  • [1] Amaratunga GAJ, 1996, APPL PHYS LETT, V68, P2529, DOI 10.1063/1.116173
  • [2] Role of nanostructure on electron field emission from amorphous carbon thin films
    Carey, JD
    Forrest, RD
    Poa, CH
    Silva, SRP
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (04): : 1633 - 1639
  • [3] Field emission site densities of nanostructured carbon films deposited by a cathodic arc
    Cui, JB
    Robertson, J
    Milne, WI
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 89 (10) : 5707 - 5711
  • [4] Electronic structure of hydrogenated carbon nitride films
    Hammer, P
    Victoria, NM
    Alvarez, F
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1998, 16 (05): : 2941 - 2949
  • [5] Role of sp2 phase in field emission from nanostructured carbons
    Ilie, A
    Ferrari, AC
    Yagi, T
    Rodil, SE
    Robertson, J
    Barborini, E
    Milani, P
    [J]. JOURNAL OF APPLIED PHYSICS, 2001, 90 (04) : 2024 - 2032
  • [6] Effect of N doping on the electron emission properties of diamondlike carbon film on a 2-in. Mo field emitter array panel
    Jung, JH
    Ju, BK
    Kim, H
    Oh, MH
    Chung, SJ
    Jang, J
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (02): : 705 - 709
  • [7] Formation of wide and narrow optical-band-gap amorphous-CNx:H films using i-C4H10/N2 supermagnetron plasma
    Kinoshita, H
    Ikuta, R
    Sakurai, K
    [J]. APPLIED SURFACE SCIENCE, 2005, 244 (1-4) : 314 - 317
  • [8] Deposition and field-emission characterization of electrically conductive nitrogen-doped diamond-like amorphous carbon films
    Kinoshita, H
    Ikuta, R
    Murakami, S
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (04): : 1857 - 1861
  • [9] Influence of plasma heating of wafer substrates on SiO2 deposition rate in a TEOS/O2 high-density plasma CVD system
    Kinoshita, H
    Otaka, N
    [J]. VACUUM, 2004, 74 (01) : 99 - 104
  • [10] Physical properties of nitrogen-doped diamond-like amorphous carbon films deposited by supermagnetron plasma chemical vapor deposition
    Kinoshita, H
    Otaka, N
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2002, 20 (04): : 1481 - 1485
123